SIMS Depth Profiling of Ultra-low Energy Ion Implanted Silicon using Sub-keV Ion Beams
Julie Bellingham, 2003, University of Warwick
Title page
Chapter 1
Chapter 2
Chapter 3
Chapter 4
Chapter 5
Chapter 6
Chapter 7
Chapter 8
Copyright © 2003 Julie Bellingham
Papers
The energy spectra of secondary ions sputtered from Si and SiGe by ultra-low-energy primary ions
J. Bellingham and M. G. Dowsett
Applied Surface Science, Volumes 203-204, 15 January 2003, Pages 130-133
Quantitative analysis of the top 5 nm of boron ultra-shallow implants
J. Bellingham, M. G. Dowsett, E. Collart and D. Kirkwood
Applied Surface Science, Volumes 203-204, 15 January 2003, Pages 851-854
Copyright © 2003 Elsevier Science B.V.